Niobium alloy sputtering target

Firmetal, 2022-12-28 08:32:00 PM

Activated carbon powder is added in the process of niobium alloy sputtering target to effectively remove oxygen impurities in the powder blank during the vacuum degassing stage before hot isostatic pressure. In addition to the niobium element, the target also contains titanium element, whose function is to adjust the corrosion resistance of the material, to achieve a better match with the copper film, and to make the material has good thermal stability.

The following is a clear and complete description of the technical scheme of the invention in combination with specific embodiments. Obviously, the embodiments described are only part of the embodiments of the invention, but not all embodiments. Based on the embodiments of the invention, all other embodiments obtained by ordinary technical personnel in the field without creative labor are within the scope of protection of the invention.

The invention relates to a preparation method for a niobium alloy sputtering target. According to the number of mass parts, the niobium alloy sputtering target contains 40~80 niobium elements and 20~60 titanium elements.

The preparation method of niobium alloy sputtering target mainly includes the following steps: Step 1. According to the number of mass parts, take 40~80 pieces of niobium powder, 20~60 pieces of titanium powder, 0.1~0.3 pieces of activated carbon powder, the purity of niobium powder and titanium powder is not less than 99.9%, through 200 mesh screen; Activated carbon powder purity is not less than 99.9%, 100 mesh screen, in the atmosphere of protective gas placed in V-type mixer, argon gas as a protective gas, according to the pellet ratio of 1:1~1.5 mixing, mixing time for 12~48h fully mixed powder;

Step 2. Load the mixed powder obtained from step 1 into the rubber sleeve, vibrate it on the shaking platform, strengthen it with steel plate, and then carry out cold isostatic pressing forming. The cold isostatic pressing pressure is 100~300MPa, and the holding time is 3~10min to get the blank body; Step 3. Put the blank body obtained in step 2 into the carbon steel plate or stainless steel plate envelope and seal it. Vacuum degassing is carried out. Among them, the process parameters of hot isostatic pressing operation are as follows: argon as medium, pressure is 100~200MPa, temperature is 1000~1500℃, holding time is 3~10h;

Tag: niobium alloy sputtering target, niobium, titanium

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