Preparation technology of tantalum strip

Firmetal, 2022-5-16 10:12:00 PM

The preparation process of tantalum strip for sputtering tantalum ring is as follows: Firstly, the tantalum material is forged by square beating and then flat beating. Then, the tantalum material is heat treated at the temperature of 1000℃ ~ 1100℃ for 60min ~ 120min, and the second heat treatment is carried out at the temperature of 1000℃ ~ 1100℃ for 60min ~ 120min. The finished product is rolled by single one-way rolling. Finally, the third heat treatment is carried out under the temperature of 1200℃ ~ 1400℃. The holding time is 120min ~ 180min. The invention can increase the material utilization rate by 6 percentage points, and can improve the processing efficiency of the product due to the simplification of the processing technology. At the same time, the process requirements of the pressure processing are easy to operate and control, the consistency of the process is easy to ensure, and the consistency of the material performance of the product is also easy to ensure.

Physical vapor deposition (PVD) is one of the most critical processes in the production of semiconductor chips. Its purpose is to deposit gold or metal compounds on silicon wafers or other substrates in the form of thin films, and then through photography and corrosion and other technologies, eventually form complex wiring structures in semiconductor chips. Physical vapor deposition is accomplished by sputtering machine, and sputtering tantalum ring is one of the key consumables used in the above process.

Sputtering tantalum ring special use environment, sputtering tantalum ring in the late processing of a surface knurling technology, that is, on the inner and outer surface of the ring processing 80TPI convex diamond knurling (that is, there are 80 fine lines in the range of 1 inch), the grain should be uniform, there can be no visible plane in the knurling area. This requires that the thickness of the blank tantalum strip of sputtering tantalum ring should be uniform and the difference between the plate and the plate should be less than 0.10mm. Otherwise, there will be uneven texture and different pattern depth during kink, or even no pattern.

Tag: tantalum strip, tantalum

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