The niobium targets are produced by electron-beam refining of niobium ingots. The target fabrication includes: mechanical deformation and machining (trimming and plane milling), vacuum re-crystallization annealing and finishing chemical treatment.
In order to reduce the stomata in the target material and improve the performance of the sputter film, the target material is usually required to have higher density. The density of the target material affects not only the sputtering rate, but also the electrical and optical properties of the film. The higher the target material density, the better the film performance.
In addition, the density and strength of the target material can better withstand the thermal stress during the sputtering process.Density is also one of the key performance indicators of the target material.
This is the picture of our niobium target product after use. The surface is as smooth and clean as a mirror. This indicates that our products have uniform grain size and stable quality. Our niobium 10 zirconium target(Nb10Zr) and niobium 1 zirconium(Nb-1Zr) can also reach this quality level.
Niobium sputtering target materials as the key ingredient of niobium and its alloy film, hold a widely usage in color TFT LCD panel PC, optical lenses, electronic imaging, information storage, solar cell, glass coatings, shipping enterprise and chemical corrosive environment.
Now, niobium sputtering target materials mostly applied in advanced touch screen, flat panel display and surface coating for energy-saving glasses. It is anti-reflective for the glass screen.