Its characteristic is that the cobalt niobium iron base material containing cobalt, iron, an active ingredient, the first to add a component and a second add ingredients, the active ingredient containing niobium, the first to add a composition containing tungsten, molybdenum, vanadium, zirconium, titanium, yttrium, manganese, aluminum, copper, nickel, phosphorus, gallium and germanium, tin, or their combination, and the second add composition contains calcium magnesium and carbon and boron, chromium, or their combination; Niobium with cobalt iron base material, the active ingredient, cobalt, and iron in the first add components and the second to the amount of added ingredients as a benchmark, the amount of the active ingredient in atomic percentage greater than 0 and is equal to or less than 20 atomic percentage, the amount of the active ingredient and the first to add ingredients atomic percentage greater than 0 and is equal to or less than 25 atomic percentage, and the second addition to the amount of atomic percentage greater than 0 and is equal to or less than 0.5 atomic percentage; Among them, the cobalt-fe-niobium target has niobium oxide, and the ratio of niobium oxide to the surface of cobalt-fe-niobium target is less than 35 /mm2.
Cobalt-iron-niobium base target material, which contains cobalt, iron, active components, first and second added components, the active component contains niobium, the first added component can contain tungsten, molybdenum, the second added component contains magnesium, carbon, boron, chromium, calcium or its combination; Taking cobalt, iron, the active component, the first added component and the total amount of the second added component in the cobalt-iron-niobium base target as the benchmark, the total amount of the active component does not exceed 20at %, the total amount of the active component and the first added component does not exceed 25at %, and the total amount of the second added component does not exceed 0.5at %. By controlling the composition of cobalt-fe-niobium target, the ratio of niobium oxide to the surface of cobalt-fe-niobium target can be effectively reduced to below 35 /mm2, thereby improving the problems such as abnormal arc discharge and spatter that are prone to occur in the previous spatter plating process.
At present, the world's target is mainly produced by Japan, the United States and Germany, China's target industry research and development is relatively lagging behind. Although some domestic universities and research institutes have developed target materials, they are still in the stage of theoretical research and trial production. There are no large companies specializing in the production of target materials, and a large number of target materials still need to be imported. Nowadays, the rapid development of high-tech industries such as microelectronics promotes the growing market of Chinese target materials, thus providing opportunities for the development of Chinese target materials industry. Target material is one of the important supporting industries of the microelectronics industry. If we can seize the opportunity to develop the target material industry in time, it will not only shorten the gap with the international target material level and participate in the international market competition, but also reduce the production cost of China's microelectronics industry and improve the international competitiveness of China's electronic products.